純度: 4N~7N
規格：常用直徑：φ25.4mm,φ50mm,φ50.8mm,φ60mm,φ76.2mm,φ80mm,φ101.6mm,φ100mm;常用厚度：3mm~6.35mm;高純銅靶材胚料的厚度，直徑均可按客戶要求定制。
主要用途：高純銅靶材胚料是利用我們自主生產的銅板經熔鑄軋制而成，主要用于光、電、半導體靶材等領域。應用于各種單靶濺射系統、多靶濺射系統、離子濺射系統等磁控濺射設備。
High purity copper target materials
Purity: 4N~7N
Specification: Common diameter: φ 25.4mm, φ 50mm, φ 50.8mm, φ 60mm, φ 76.2mm, φ 80mm, φ 101.6mm, φ 100mm; common thickness: 3mm ~ 6.35mm; the thickness and diameter of high-purity copper target embryo material can be customized according to customer requirements.
Main Usage：
High purity copper target blank is made of our own copper plate by melting, casting and rolling. It is mainly used in optical, electrical, semiconductor targets and other fields. It is used in various magnetron sputtering equipment, such as single target sputtering system, multi target sputtering system and ion sputtering system.
